US2690966A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photomechanical resist
Assignee: Eastman Kodak Co
•
Filing: 1951-01-20
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Granted: 1954-10-05
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Expires: 1971-01-20
Abstract
No abstract record available.
Inventors
- 👤 Louis M Minsk
- 👤 Werter P Van Deusen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 05:15
CPC Classifications
C; C04; C04B; C04B41/00; C04B41/009; C04B41/45; C04B41/50; C04B41/80; C04B41/81; C04B41/85; C08; C08F; C08F8/00; C08F8/14; G; G03; G03F; G03F7/00; G03F7/004; G03F7/0047; G03F7/027; G03F7/028; G03F7/031; G03F7/038; G03F7/0388; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/111; Y10S430/114; Y10S430/12
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
33 words
A PHOTOMECHANICAL RESIST COMPOSITION COMPRISING A POLYMERIC MATERIAL SELECTED FROM THE GROUP CONSISTING OF CINNAMIC ACID ESTERS OF POLYVINYL ALCOHOL CONTAINING AT LEAST 60 MOL PERCENT OF RECURRING STRUCTURAL UNITS HAVING THE FORMULA
Claim 2
Dependent Claim
33 words
A PHOTOMECHANICAL RESIST COMPOSITION COMPRISING A POLYMERIC MATERIAL SELECTED FROM THE GROUP CONSISTING OF CINNAMIC ACID ESTERS OF POLYVINYL ALCOHOL CONTAINING AT LEAST 60 MOL PERCENT OF RECURRING STRUCTURAL UNITS HAVING THE FORMULA
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1957-10-04 | 1958-04-05 | 1958-10-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1961-10-04 | 1962-04-05 | 1962-10-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1965-10-04 | 1966-04-05 | 1966-10-05 | $7700.00 | Window Closed / Lapsed |