Electrodeposition of nickel

Claim 1

THE METHOD OF ELECTRODEPOSITING NICKEL TO PRODUCE SMOOTH, DUCTILE, EASY-BUFFING DEPOSITS WHICH COMPRISES ELECTROLYZING A BODY OF A SOLUTION CONTAINING AS ESSENTIAL CONSTITUENTS NICKEL SULPHATE 120 TO 400 GRAMS PER LITER, NICKEL CHLORIDE 15 TO 60 GRAMS PER LITER, FORMIC ACID 5 TO 30 GRAMS PER LITER, AND BORIC ACID FROM 30 TO 40 GRAMS PER LITER, THE SOLUTION BEING FREE OF AMMONIA AND AMMONIUM SALTS IN AMOUNT WHICH WILL DELETERIOUSLY EFFECT THE SMOOTHING ACTION OF THE DEPOSITED NICKEL, AND FREE FROM IMPURITIES IN AMOUNTS OF NOT MORE THAN 5 MILLIGRAMS PER LITER OF ALUMINUM, NOR MORE THAN 1 MILLIGRAMS PER LITER OF CHROMIUM, NOT MORE THAN 20 MILLIGRAMS PER LITER OF COPPER, AND NOT MORE THAN 1 MILLIGRAM PER LITER OF FERROUS IRON, PURIFYING SAID BODY OF SOLUTION WITH RESPECT TO SAID IMPURITIES, THE FREQUENCY OF SAID PURIFICATION AND THE EXTEND THEREOF BEING SUCH AS TO MAINTAIN THE PURITY OF THE SOLUTION, DURING ELECTROLYSIS, WITHIN SAID LIMITS, MAINTAINING THE PH OF THE SOLUTION, DURING ELECTROLYSIS, BETWEEN 2 AND 4, AND DISCONTINING THE ELECTROLYSIS BEFORE THE SUBSTANTIALLY GREATER THAN EXCEEDED A THICKNESS SUBSTANTIALLY GREATER THAN 0.003 INCH, WHEREBY DEPOSITS ARE OBTAINED WHICH ARE DUCTILE, EASILY BUFFED, AND HAVE A SURFACE SUBSTANTIALLY SMOOTHER THAN THE SURFACE OF THE CATHODE ON WHICH THEY ARE DEPOSITED.

Claim 2

THE METHOD OF ELECTRODEPOSITING NICKEL TO PRODUCE SMOOTH, DUCTILE, EASY-BUFFING DEPOSITS WHICH COMPRISES ELECTROLYZING A BODY OF A SOLUTION CONTAINING AS ESSENTIAL CONSTITUENTS NICKEL SULPHATE 120 TO 400 GRAMS PER LITER, NICKEL CHLORIDE 15 TO 60 GRAMS PER LITER, FORMIC ACID 5 TO 30 GRAMS PER LITER, AND BORIC ACID FROM 30 TO 40 GRAMS PER LITER, THE SOLUTION BEING FREE OF AMMONIA AND AMMONIUM SALTS IN AMOUNT WHICH WILL DELETERIOUSLY EFFECT THE SMOOTHING ACTION OF THE DEPOSITED NICKEL, AND FREE FROM IMPURITIES IN AMOUNTS OF NOT MORE THAN 5 MILLIGRAMS PER LITER OF ALUMINUM, NOR MORE THAN 1 MILLIGRAMS PER LITER OF CHROMIUM, NOT MORE THAN 20 MILLIGRAMS PER LITER OF COPPER, AND NOT MORE THAN 1 MILLIGRAM PER LITER OF FERROUS IRON, PURIFYING SAID BODY OF SOLUTION WITH RESPECT TO SAID IMPURITIES, THE FREQUENCY OF SAID PURIFICATION AND THE EXTEND THEREOF BEING SUCH AS TO MAINTAIN THE PURITY OF THE SOLUTION, DURING ELECTROLYSIS, WITHIN SAID LIMITS, MAINTAINING THE PH OF THE SOLUTION, DURING ELECTROLYSIS, BETWEEN 2 AND 4, AND DISCONTINING THE ELECTROLYSIS BEFORE THE SUBSTANTIALLY GREATER THAN EXCEEDED A THICKNESS SUBSTANTIALLY GREATER THAN 0.003 INCH, WHEREBY DEPOSITS ARE OBTAINED WHICH ARE DUCTILE, EASILY BUFFED, AND HAVE A SURFACE SUBSTANTIALLY SMOOTHER THAN THE SURFACE OF THE CATHODE ON WHICH THEY ARE DEPOSITED.