Method for increasing the surface wetability of low dielectric constant material
Abstract
Abstract A method for increasing the surface wetability of an inorganic low dielectric constant material comprises: using an inorganic dielectric constant material to form a low dielectric constant barrier layer on a semiconductor device by a chemical vapor deposition; and using an UV processing process to treat the surface of the inorganic low dielectric constant material in order to change the surface property from hydrophobic to hydrophilic. Thus, the surface wetability of the inorganic low dielectric constant material can be increased, while the adhesion between the inorganic low dielectric constant material and an organic polymer can be increased.
Inventors
- 👤 Jeng-Yuan Tsai
- 👤 Ming-Sheng Yang
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