Aligner

Abstract

Abstract PURPOSE:To disposing an aligning optical system without shielding an exposure optical light and to accurately align an aligning optical system by introducing a luminous flux obliquely to a mask and a substrate and bending an optical path by a reflecting mirror. CONSTITUTION:An X-lay 1 irradiated from the window of an X-ray source is radiated to a mask 5 and a wafer 6, and a region to be irradiated with the X-ray 1 is set by an aligning optical system. The light from the aligning light source 11 of this optical system is incident to a reference mask 13 provided on a reference grating 14, and the incident light beam through the mask 13 is incident through a Fourier transforming lens having a first lens system 15, a space filter 16 and a second lens system 17. The optical path of the radiated light from the system 17 is bent by a reflecting mirror 12, and incident obliquely to an aligning grating 18 on the mask and an aligning grating 19 on a substrate. A pattern on the mask is accurately aligned with a pattern on the substrate, and an aligning signal during exposure is observed by a photodetector 20.

Inventors

• 👤 Noboru Nomura
• 👤 Kazuhiro Yamashita
• 👤 Keisuke Koga
• 👤 Masaki Suzuki
• 👤 Yuichiro Yamada

Bibliographic Details