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JPS6489133A Expired / Lapsed JP ⏱️ 0.0 years remaining

Ion source

Assignee: Toshiba Corp
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Filing: 1987-09-30
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Granted: —
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Expires: 2007-09-30
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Abstract

Abstract PURPOSE:To make the control of drawing-out easy, the selection of ion production possible, and also the production of a low speed ion beam easy, in a simple structure, by radiating the light to a gas led into a vacuum container. CONSTITUTION:A gas such as BF3 or the like is sprayed from a nozzle 7 and led to an ionization chamber of a vacuum container. And the BF3 gas is irradiated with the incident light from a vacuum line 5 which is connected to a synchrotron orbital radiation(SOR) to generate ions, and the ions accelerated by a weak electric field between electrodes 8 and 9 are drawn out. By using such a simple structure requiring no gas discharge and the like, the ion source is acquired in which the ion production and drawing-out can be controlled easily, the selectivity of the ion production is expanded, and the production of low speed ion beams can be also realized easily.

Inventors

  • 👤 Nobuo Hayasaka

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-05 17:22
CPC Classifications
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