Agent for peeling photoresist

Abstract

Abstract PURPOSE:To enhance peeling power by incorporating dimethylsulfoxide and at least one of aminoalcohols, and water. CONSTITUTION:The resist peeling agent strong in the peeling power is obtained by incorporating dimethylsulfoxide, preferably, in an amount of >=30wt.%, and at least one of the aminoalcohols, preferably, in an amount of 1-50wt.%, and water, preferably, in an amount of 5-60wt.%, each on the basis of the total weight of the peeling agent, thus permitting the obtained peeling agent to have high peeling power, to exhibit superior washing power for ionic substances, by the presence of water, and to perfectly clean the surface of an inorganic base after finishing cleaning.

Inventors

• 👤 Katsuo Matsumoto
• 👤 Kazuyuki Hamada

Bibliographic Details