Solid-state image sensing device and manufacture thereof

Abstract

Abstract PURPOSE:To shorten a manufacturing process by a method wherein each micro- lens is made to have its original spectrum sensitive property. CONSTITUTION:Plural photodiodes 2 are provided in a semiconductor substrate 1 as a photosensitive part, and a passivation film 3 and colour filter layers 4 are formed on the semiconductor substrate 1. The colour filter layers 4 are, for instance, composed of three layers of three colours, R, G, and B and micro- lenses 5' are built thereon. The micro-lenses 5' are pigmented, have their own original spectrum sensitive property, and are provided with functions of both a micro-lens and a colour filter layer which a conventional device has. By these processes, one of the processes of forming colour filter layers can be dispensed with.

Inventors

• 👤 Tadashi Enomoto

Bibliographic Details