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JPS6467928A Expired / Lapsed JP ⏱️ 0.0 years remaining

Manufacture of semiconductor device

Assignee: Hitachi Ltd
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Filing: 1987-09-09
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Granted: —
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Expires: 2007-09-09
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Abstract

Abstract PURPOSE:To eliminate the deviation of aligning the wirings of a circuit substrate and connecting wirings by forming the wirings of the substrate and the connecting wirings for connecting the outer terminal of a semiconductor chip in the same manufacturing step. CONSTITUTION:A filler 4 is filled in the hole 2B of a circuit substrate 2, and a semiconductor chip 3 is buried in the hole. A wiring forming layer 5 is formed on a whole surface including them on an interlayer insulating film 2C of the substrate 2 on the passivation film 3D of the chip 3. Then, the layer 5 is coated with a photoresist film. An etching mask 7 is formed by patterning it in a predetermined shape by photolithography. The layer 5 is etched with the mask 7, and connecting wirings 5A and wirings 5B are formed in the same manufacturing step. The layer 5 is etched by anisotropic dry etching, and the mask 7 is removed.

Inventors

  • 👤 Shinichi Shoji

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-04 05:06
CPC Classifications
H; H10; H10W; H10W70/00; H10W70/099; H10W70/60; H10W74/00; H10W74/10; H10W74/131; H10W74/142; H10W90/00

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