mask

Abstract

Abstract PURPOSE:To decrease the number of pieces of a mask to be prepared in a process for transferring plural kinds of patterns, by forming at least two kinds of patterns in a mask blank, respectively, and also, constituting each pattern so that a light beam of a specific wavelength is allowed to transmit through. CONSTITUTION:At least two kinds of patterns 4, 6 are formed in a mask blank 2, respectively, and also, each pattern 4, 6 is constituted so that a light beam of a specific wavelength is allowed to transmit through. When a light beam having a specific single wavelength is radiated as an exposure light to a photomask 1, this light transmits through only a part of the pattern 4 which has been constituted so as to correspond to its single wavelength, therefore, only its pattern 4 is transferred. Thereafter, when a light beam having other single wavelength is radiated as an exposure light to the photomask 1, only other pattern 6 is transferred at this time. In this way, the number of pieces of a mask to be prepared in a process for transferring plural kinds of patterns can be decreased.

Inventors

• 👤 Sakae Matsuzaki
• 👤 栄 松崎
• 👤 Ryoichi Ono
• 👤 小野　良一

Bibliographic Details