Hybrid ion plating device

Abstract

Abstract PURPOSE:To efficiently form a thin film having good performance and uniform thickness by depositing the film by evaporation on a work which moves at a high speed by using a means for high-frequency excitation together with plasma discharge of a pressure gradient type. CONSTITUTION:A pressure gradient type plasma gun 6 is provided in a vacuum chamber 1 which is airtightly held by a bell-jar 2 and the high-frequency excitation means 7 is provided between a hearth 5 of an evaporating raw material and the work 8. The inside of the vacuum chamber 1 is evacuated to a vacuum through a discharge port 3 and a reactive gas is introduced through an introducing port 4 into the chamber. The plasma current emitted from the plasma gun 6 is converged to the hearth 5 and the work 8 is moved at a high speed. The evaporating particles from the hearth 5 are then ionized by glow discharge and are excited by the high-frequency excitation means 7, by which the stable thin film is continuously formed on the work 8 surface. The discharge voltage in this stage is specified to about 50-100V, the high-frequency power to about 100W - several kW and the moving speed of the work 8 to about 6-40m/min.

Inventors

• 👤 Tetsuya Nomachi
• 👤 野町　▲吉▼也
• 👤 Yoichi Murayama
• 👤 洋一 村山

Bibliographic Details