Positive type radiation sensitive resin composition

Abstract

Abstract PURPOSE:To obtain the titled composition having improved sensitivity and anti-dryetching property against radial rays by incorporating an alkali soluble resin and a halogenated polyolefin sulfone to the titled composition. CONSTITUTION:The titled composition contains the alkali soluble resin, preferably the alkali soluble novolak resin, and the halogenated polyolefin sulfone for example, chlorinated poly(2-methyl-1-pentene sulfone). The halogenated compd. of the latter is obtd. by reacting a halogenating agent to polyolefin sulfone. If necessary, the titled composition comprises a surface active agent, a sensitizer and a solubility controller, etc., in addition to said both resins. Said additives are used by dissolving it to an org. solvent. Thus, the titled composition having the high sensitivity and the excellent anti-etching property against the radial rays such as far ultra-violet rays, electron rays and X rays, etc., is obtd.

Inventors

• 👤 Mitsunobu Koshiba
• 👤 小柴　満信
• 👤 Yoshiyuki Harita
• 👤 榛田　善行

Bibliographic Details