Rotating table

Abstract

Abstract PURPOSE:To prevent the contamination of the surface of a wafer when a resist is applied or the resist is developed, and to improve yield in a wafer flowing process by forming the central shaft of a rotating table by a synthetic resin. CONSTITUTION:A central shaft 1 takes a cylindrical shape, is made of a fluorocarbon group resin, and is fixed to a rotating table 2 consisting of aluminum. When a process in which a resist is applied or the resist is developed is executed, the central shaft 3 has water repellency because it is shaped by the fluorocarbon group resin, and repels a liquid, such as the resist, a resist developer, etc., and the intrusion of the liquid to a clearance between the central shaft 1 and a hole section 3a at the central section of a wafer 3 is prevented. Consequently, a wafer surface cleanly dried once is not contaminated on subsequent revolution at high speed. The same effect is also acquired when a synthetic resin except the fluorocarbon group resin is used as the central shaft or when the whole rotating table is manufactured by a synthetic resin.

Inventors

• 👤 Shinichi Kamisuke
• 👤 真一 紙透

Bibliographic Details