X-ray reflecting mirror

Abstract

Abstract PURPOSE:To obtain an X-ray multiple-reflecting mirror which has high reflectivity of even the direct incident rays and has an X-ray dispersion characteristics in a wavelength region from 1Angstrom to 200Angstrom of an objective wavelength region by alternately laminating silicon oxide layers and metallic layers on a substrate. CONSTITUTION:This reflecting mirror is formed by alternately laminating the silicon oxide having largely different optical constants and the metallic layers 3 contg. >=1 kinds of elements among Mo, Ru, Pd, Af, Hf, Ta, W, Re, Os, Ir, Pt, and Au on the metallic substrate 5 consisting of glass, silicon wafer, graphite, etc. The metallic substrate 5 is the ultraprecisely polished substrate on which the dense continuous films having several Angstrom - several 100Angstrom thickness of one layer are laminated by alternate vapor deposition of silicon oxide and metals. The metallic layers 4 which reflect X-ray and the silicon oxide layers 4 as spacers are laminated into the multiple layers, by which the X-rays are multiple-reflected and the reflectivity is increased.

Inventors

• 👤 Tadashi Sato
• 👤 正 佐藤
• 👤 Kunio Nakajima
• 👤 邦雄 中島
• 👤 Hiroyuki Suzuki
• 👤 弘幸 鈴木
• 👤 Koichi Tamura
• 👤 浩一 田村

Bibliographic Details