Titanium nitride target and its production

Abstract

Abstract PURPOSE:To produce a high density and high purity titanium nitride target having a low oxygen content by hot pressing titanium nitride powder to high density optionally after mixing with titanium hydride and dehydrogenation and by working the hot pressed body. CONSTITUTION:Chips obtd. by machining an ingot formed by melting high purity titanium with electron beams are nitrided by heating in a surface nitrided titanium vessel in a high purity nitrogen atmosphere. The resulting titanium nitride powder is hot pressed to >=90% theoretical density ratio after the powder is mixed with titanium hydride and dehydrogenated so as to regulate the ratio of N to Ti as required. The titanium hydride is obtd. by heating the above- mentioned titanium chips in a flow of a gaseous Ar-H2 mixture. The hot pressed body is then worked into a target. This target is a high density and high purity titanium nitride TiNx (x=0.1-1.0) target having >=90% theoretical density ratio and <2,500ppm O2 content. The Fe content in the target is preferably reduced to <10ppm.

Inventors

• 👤 Susumu Sawada
• 👤 沢田　進
• 👤 Yoshiharu Kato
• 👤 義春 加藤
• 👤 Osamu Kanano
• 👤 治 叶野
• 👤 Masaaki Fujioka
• 👤 藤岡　将明

Bibliographic Details