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JPS63228718A Expired / Lapsed JP ⏱️ 0.0 years remaining

Photochemical vapor growth equipment

Assignee: Sony Corp
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Filing: 1987-03-18
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Granted: —
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Expires: 2007-03-18
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Abstract

Abstract PURPOSE:To make it possible to form a uniform thin film, and prevent photochemical reaction product from depositing on the light introducing window of a reaction chamber, by moving relatively a light for photochemical reaction on a substrate which is to be subjected to a vapor growth, via a convergent lens system, CONSTITUTION:A lens system 7 is constituted of a concave lens system 7a and a convex lens 7B movable in the direction of an optical axis. A light from a light source 6 is converged on the surface of a substrate 1 which is to be subjected to a vapor growth, via the lens system 7 and light introducing window 5. The conversion position is relatively moved on the substrate 1, via the lens 7B. By the converged light moving relatively, the reaction gas in the vicinity of the substrate 1 surface generates a photochemical reaction, and a thin layer of photochemical reaction product is uniformly formed on the surface of the substrate 1. The luminous flux introduced into the reaction chamber 2 is converged on the substrate 1, and it turns into a dispersion light of low density at the time of penetrating the window 5. Therefore, the generation probability of an active film becomes small, so that photochemical reaction product is prevented from depositing on the light introducing window.

Inventors

  • 👤 Junichi Sato
  • 👤 淳一 佐藤

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-30 18:16
CPC Classifications
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