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JPS6318352A Expired / Lapsed JP ⏱️ 0.0 years remaining

Mask for split exposure

Assignee: National Institute of Advanced Industrial Science and Technology
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Filing: 1986-07-11
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Granted: —
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Expires: 2006-07-11
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Abstract

Abstract PURPOSE:To prevent a wiring pattern from breaking and short-circuiting by making the interval of wiring at a part which engages a boundary area larger than that at other parts. CONSTITUTION:Wiring patterns 10 and 20 with 5mum signal wiring width are formed on a wiring board by split exposure at wiring pitch of 10mum. Masks are so designed that the right end of a 1st mask and the left end of a 2nd mask overlap with each other by 10mum, but the wiring pitch becomes 20mum in a boundary exposure area 3 and areas of 10mum on both its side, and the signal wiring width is 10mum. In the mutual boundary area of the divided masks, the wiring pitch is made larger than another part to absorb the relative position shift between the divided masks, thereby preventing the wiring pattern from breaking and short-circuiting.

Inventors

  • 👤 Tatsuo Inoue
  • 👤 龍雄 井上

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-29 01:04
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70425; G03F7/70475; G03F1/00

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