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JPS63170A Expired / Lapsed JP ⏱️ 0.0 years remaining

Semiconductor device

Assignee: Fujitsu Ltd
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Filing: 1986-06-19
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Granted: —
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Expires: 2006-06-19
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Abstract

Abstract PURPOSE:To improve characteristics by forming a non-doped AlGaAs layer and a GaAs/AlGaAs superlattice as buffer layers, making a non-doped GaAs channel layer thinner than the AlGaAs buffer layer and shaping an AlGaAs electron supply layer. CONSTITUTION:A non-doped GaAs channel layer 5 is grown on a buffer constituted of an AlGaAS layer 2, a superlattice 3 and an AlGaAs layer 4 from the substrate 1 side, an a two-dimensional electron gas 5e is formed near a hetero-junction interface with an AlGaAs electron supply layer 6. Consequently, the disturbance of the interface of buffer layer/channel layer is inhibited, an adverse effect such as the deterioration of mobility on the two-dimensional electron gas 5e is prevented even when the GaAs channel layer 5 is thin. Accordingly, the GaAs channel layer 5 is thinned, thus improving characteristics such as the displacement of pinch-off voltage due to the spreading of the two-dimensional electron gas 5e.

Inventors

  • 👤 Tatsuya Ohori
  • 👤 達也 大堀

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-01 06:48
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/40; H10D30/47; H10D30/471; H10D30/473; H10D62/00; H10D62/80; H10D62/81; H10D62/815; H10D62/8161; H10D62/8162; H10D62/8164

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