Method of forming anti-reflection film

Abstract

Abstract PURPOSE:To form an antireflection film having excellent adhesiveness and durability, by laminating a dielectric material onto an optical glass element while projecting an inert gaseous ion beam thereto. CONSTITUTION:The dielectric material is laminated on the optical glass element formed by press-molding a glass article subjected to a preliminary etching treatment while the inert gaseous ion beam is projected to said element. The etching treatment of the glass article is executed by combining a stage for immersing a glass stock into an aq. hydrogen fluoride soln., stage for rinsing and stage for removing moisture. For example, magnesium fluoride is used as the dielectric material and the film of the magnesium fluoride is formed to lambda/4 (lambda=780nm) optical film thickness while the ion beam is projected to the optical glass element by a resistance heating method in a gaseous CF4 atmosphere.

Inventors

• 👤 Toshiaki Ogura
• 👤 敏明 小倉

Bibliographic Details