Manufacture of semiconductor device

Abstract

Abstract PURPOSE:To clean a rotary brush in a short time by a method wherein the rotary brush is brought into contact with the surface of a ceramic plate and rotated. CONSTITUTION:When a cleaning process of a plurality of semiconductor wafers W is finished and a rotary brush 2 is contaminated to the extent of the allowable contamination limit, a ceramic plate 20 is aligned and placed on a turn- table 1 in place of the semiconductor wafer W. If the rotary brush 2 is pressed against the ceramic plate 20 with a predetermined contact pressure and rotated while the turn table 1 is being turned and cleaning solution is being supplied from a cleaning solution feeding nozzle 4 onto the ceramic plate 20, microdust adhering to the hair planting part of the rotary brush 2 is frictioned off by the fine unevenness of the surface of the ceramic plate 20 and washed off by the cleaning solution. After this state is maintained for a predetermined period, the rotary brush 2 is stopped and restored into a waiting position A and the supply of the cleaning solution from the cleaning solution feeding nozzle 4 is discontinued and the ceramic plate 20 is taken out of the turn table 1.

Inventors

• 👤 Iwao Matsushima
• 👤 松島　巖

Bibliographic Details