Exposure apparatus

Abstract

Abstract PURPOSE:To improve halo due to spherical aberration in a projection optical system, by partially scanning the surface of a reticle with light through a hole, and moving the reticle or a wafer in the direction of the optical axis of the projection optical system in synchronization with the scanning at this time. CONSTITUTION:Luminous flux from a light source 2 is converged by an elliptical mirror 1 and guided to a first lighting system 3. A hole 4, which is a basic exposture unit, is lighted. The luminous flux passing through the hole 4 is reflected by a reflecting mirror 20 and further reflected by two scanning vibration mirrors 5 and 6. Thereafter, the surface of a reticle 8 is illuminated by a second lighting system 7'. A driving device 14 drives a stage 11 in the direction of an optical axis S of a projection optical system 9. The amount of driving at this time is an amount corresponding to the optical characteristics of the projection optical system 9, e.g., the curving characteristic of the surface of an image and the flatness of a wafer 10, which is obtained by a focusing system. Thus, halo due to spherical aberration in the projection optical system is efficiently improved. The size of a screen can be substantially expanded by correcting the nonplanar property of the wafer.

Inventors

• 👤 Akiyoshi Suzuki
• 👤 章義 鈴木

Bibliographic Details