Production of color filter

Abstract

Abstract PURPOSE:To improve flatness and filter characteristic by subjecting a substrate to full-surface exposure from the rear surface thereof to form the remaining pattern with the other pattern formed in a manner that one pattern group remains as a mask thereby preventing drop-out and making the formation sequence of the pattern groups free. CONSTITUTION:The red, blue and green patterns R, B, G consisting of a preliminarily colored polyimide resin are successively formed by a photolithography technique on the surface of a substrate 1. The substrate is then subjected to full-surface exposure from the rear of the substrate with the three-color patterns as a mask to form a black pattern Bl in the spacings between the patterns of the respective colors. Since a brightening agent is added to the blue pattern B, the formation sequence of the pattern groups is made free and the flatness and filter characteristic are improved. The drop-out is prevented and the pattern break is improved by filling the spacings between the patterns with the rear exposure. Since the black pattern is formed only in the spacings, the color patterns of the large picture elements are easily formed without spoiling the color balance.

Inventors

• 👤 Masayoshi Shimamura
• 👤 正義 島村
• 👤 Yoshihiro Yamamoto
• 👤 山本　吉広

Bibliographic Details