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JPS6289312A Expired / Lapsed JP ⏱️ 0.0 years remaining

Magnetically soft thin film

Assignee: Sony Corp
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Filing: 1985-10-16
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Granted: —
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Expires: 2005-10-16
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Abstract

Abstract PURPOSE:To obtain the titled soft magnetic thin film having a high permeability, an excellent corrosion-resisting property, an excellent abrasion-resisting property and thermary stable property without lowering the density of saturated magnetic flux and also without increasing the magnetic coercive force by a method wherein nitrogen N is added to the magnetic thin film having Fe, Ga and Si as the main component, and the composition of component of the magnetic thin film is specified. CONSTITUTION:The composition of the titled soft magnetic thin film is indicated by the formula of Fea, Gab, Sic, and Nx (provided that the compositional ratio of a, b, c and x is indicated by atom%), their ranges of composition are 55<=a<=84, 1<=b<=23, 3<=c<=31 and 0.1<=x<=20, and an excellent serviceability is given to the magnetically soft thin film of the composition of a+b+c+x=100. The characteristics of the magnetically soft thin film are nullified or deteriorated in the compositional range other than the above-mentioned range. It is desirable that the soft magnetic thin film is manufactured by performing a vapor- deposition method, an ion-implanting method and the like. Also, pertaining to the method wherein nitrogen N is introduced into the magnetic thin film, there are the method in which vapor deposition and the like is performed in the atmosphere containing nitrogen gas and the method in which nitrogen N is introduced into the magnetic thin film using the compound, consisting of nitrogen N and at least a kind of element selected from the above-mentioned material, and the alloy of the remaining component as the source of evaporation.

Inventors

  • 👤 Kazuhiko Hayashi
  • 👤 和彦 林
  • 👤 Masatoshi Hayakawa
  • 👤 正俊 早川
  • 👤 Osamu Ishikawa
  • 👤 理 石川
  • 👤 Yoshitaka Ochiai
  • 👤 落合 祥隆
  • 👤 Hideki Matsuda
  • 👤 秀樹 松田
  • 👤 Hiroshi Iwasaki
  • 👤 洋 岩崎
  • 👤 Koichi Aso
  • 👤 阿蘇 興一

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-04 20:57
CPC Classifications
—

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