Production of thin film magnetic head

Abstract

Abstract PURPOSE:To form a thin film magnetic head which obviates the disconnection of a head and the increased tendency to crosstalks and has the excellent accuracy of a track width by controlling the incident angle of an ion beam by a taper angle and finally reetching an upper magnetic layer at <=25 deg. incident angle of the ion beam in the case of subjecting the upper magnetic layer to ion milling. CONSTITUTION:A photoresist and the upper magnetic layer 9 are dry-etched by Ar ions at >=25 deg. and <=30 deg. incident angle of the ion bean when the taper angles theta1, theta2 of insulating layers 3, 5, 7 are in a 30-50 deg. range after the photoresist coated on the upper magnetic layer 9 is patterned to a prescribed shape. The upper magnetic layer 9 is thereby etched in an ideal manner without having overetching or imcomplete etching in the tapered parts. Tail part 14 are thoroughly etched if the layer 9 is subjected to the ion milling at <=25 deg. incident angle of the ion beam at which the ion beam is not shadowed by the photoresist after the greater part of said layer is etched at the above-mentioned incident angle of the ion beam. The accuracy of the track width is thus improved.

Inventors

• 👤 Yoshiaki Kato
• 👤 吉明 加藤

Bibliographic Details