Vertical vapor phase chemical generator

Abstract

Abstract PURPOSE:To supply reaction gas uniformly and perpendicularly on the all wafers regardless of positions on a susceptor by disposing a plurality of gas supply chambers of tubes rectangular doughnut-shaped in section in a gas supply unit, forming a plurality of gas supply holes, and further forming the openings of the supply holes of porous silicon carbide. CONSTITUTION:Gas supply chambers 5 of tubes rectangular doughnut-shaped in section are formed in a gas supply unit 2. A plurality of chambers 5 of different radii are concentrically provided. The chambers 5 have in the bottoms a plurality of gas supply holes 6 of circular section having the same diameter as that of the wafer, and the holes 6 are formed of a silicon carbide of porous material. Further, independent gas supply tubes 7 are mounted in the chambers 5, and the concentration and the flow rate of the reaction gas can be controlled in the respective chambers by flowrate meters 8.

Inventors

• 👤 Takuro Yonemaru
• 👤 米丸　卓郎

Bibliographic Details