Method and apparatus for producing glass film of optical waveguide circuit

Abstract

Abstract PURPOSE:To obtain the glass film having a good dimensional stability by irradiating a laser ray to the glass film, at an angle of <=20 deg., thereby calculating a thickness and a bulk density of the film with a reflected light in the production of the glass film in which a quartz glass plate is placed on a rotating heating element, and fine glass powders are deposited on the prescribed quartz glass plate in a fire flame to form a porous glass layer followed by sintering it with heating to form the glass film. CONSTITUTION:The substrate 5 composed of the quartz glass plate or the silicon single crystal plate on which the glass film is deposited on the surface thereof is placed on the heating element 1 which intermittently rotates. The starting material of the glass, oxygen and hydrogen are sprayed on the substrate 5 from a feeding apparatus 310 through a synthesizing touch 2. Thus, the porous glass layer 6 composed of the glass fine particles 4 is deposited on the substrate 5 followed by sintering it with heating to form a desired glass film. By constituting as mentioned above, the laser ray source 21 and the light receiving system 39 are provided on the both sides of the substrate 5, and the beam 26 is irradiated on the glass layer 6 at the angle of <=20 deg. from the light source 21, and then, the calculation device 312 and the positioning device 311 are operated by the reflected light 28, thereby controlling the torch 2.

Inventors

• 👤 Shoichi Sudo
• 👤 昭一 須藤
• 👤 Mitsuho Yasu
• 👤 安　光保
• 👤 Masao Kawachi
• 👤 河内　正夫

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