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JPS624872A Expired / Lapsed JP ⏱️ 0.0 years remaining

Film formation device

Assignee: Toshiba Corp
•
Filing: 1985-06-28
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Granted: —
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Expires: 2005-06-28
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Abstract

Abstract PURPOSE:To perform the film formation uniformly and efficiently on a supporter in case of providing a rodlike supporter between the first cylindrical electrode and the second cylindrical electrode in the inside of a reaction vessel and performing the film formation with the glow discharge by conducting electrically both the reaction vessel and the second cylindrical electrode. CONSTITUTION:A film formation device 1 is constituted on the first grounded cylindrical electrode 3, plural rodlike supporters 2 provided on a circle concentrical therewith in the equiintervals and a vacuum chamber 5 as an airtight reaction vessel surrounding the second cylindrical electrode 4 of the outside thereof from the outside. The supporters 2 are respectively rotated with a motor 6 and heated with a heater. The second cylindrical electrode 4 is not grounded and electrically floated via an insulator 8a and provided with plural gas blow- out ports 4a and the chamber 5a is floated with the insulator 8a so that it is made to same electric potential as the electrode 4. An excellent film formation is efficiently formed on the supporters 2 by introducing a gaseous raw material through an introduction port 11, impressing voltage on the electrodes 3, 4 from an electric source 9 to generate the glow discharge and thereby using effectively the introduced electric power.

Inventors

  • 👤 Mutsuki Yamazaki
  • 👤 六月 山崎

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-04 03:22
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/509; C23C16/5093

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