Projection exposure device

Abstract

Abstract PURPOSE:To accelerate the responding speed by a method wherein an optical correcting means changing distortion of a projection optical system transmitting exposure light which is distortedly deformed from a plane perpendicular to an optical axis is arranged in an optical path of the projection optical system. CONSTITUTION:The exposure light from a light source lamp 11 arranged in front of a reflecting mirror 9 irradiates a mask 13 as the first object. The light passing through the mask 13 image-forms the pattern of mask 13 on a wafer 15 as the second object by a projector lens 14 to print the mask pattern on a photoresist on the wafer 15. A parallel plane glass 1 as a main part of optical correction element is arranged on an optical path between the projection lens 14 and the mask 15. When the optical correction element is distortedly deformed, the distortion is changed corresponding to the deformation to make the directions in distortion change multiple by selecting the direction of deformation. Through these procedures, the responding speed can be accelerated.

Inventors

• 👤 Makoto Torigoe
• 👤 真 鳥越
• 👤 Ichiro Kano
• 👤 一郎 加納
• 👤 Mamoru Iijima
• 👤 飯島　守
• 👤 Taro Omori
• 👤 大森　太郎

Bibliographic Details