Molecular beam epitaxy device

Abstract

Abstract PURPOSE:To reduce the size of a molecular beam epitaxy device adapted for a mass production by disposing an input chamber and an output chamber to be readily partitioned by a partition wall from a growing chamber, and composing substrate conveying means of a rotary board. CONSTITUTION:An input chamber 4, a growing chamber 2 and an output chamber 5 are respectively provided in ranges from the rotating start of a rotary board to 3/8 revolution, from the 3/8 revolution 5/8 revolution and from the 5/8 revolution to the starting point. a substrate 11 set to a cassette 17 is delivered to a substrate placing unit 16 by evacuating the chamber 4 and then opening a gate valve 7. Then, the substrate 11 is rotated to the position of code M2, and stopped. A gate valve 6 is opened, a feeding mechanism 18 is extended to the delivering place in the chamber 3, the substrate 11 is raised, and engaged with a rotary manipulator 9. The valve 6 is closed, and a molecular beam crystal growth is executed. After the growth is finished,the substrate 11 is returned to a point of the code M2. The unit 16 is rotated to the position of code M3, a gate valve 8 is opened, and the substrate 11 is delivered to the cassette 17 of the chamber 5.

Inventors

• 👤 Naoyuki Tamura
• 👤 直行 田村
• 👤 Hideaki Kanbara
• 👤 秀明 蒲原
• 👤 Norio Kanai
• 👤 金井　謙雄
• 👤 Kazuaki Ichihashi
• 👤 市橋　一晃

Bibliographic Details