ferromagnetic thin film

Abstract

Abstract PURPOSE:To facilitate a control of magnetic anisotropy by impressing stress upon a ferromagnetic thin film and providing the thin film with magnetic anisotropy after forming such thin film. CONSTITUTION:When uniaxial stress sigma is impressed inside a film face of ferromagnetic thin film, uniaxial magnetic anisotropy K is given in parallel with sigma. If a magnetostrictive constant of ferromagnetic thin film is lambdas, K is shown by =3lambdassigma/2. In addition, lambdas of Fe-Co-Si system alloy thin film which is vacuum deposited with a photoceram substrate is -0.5X10<-6> and its easy magnetizing direction is in parallel with a longitudinal direction and then its magnetic anisotropic constant K is shown by K=6.25X102erg/cm<3>. Subsequently, when a substrate 13 is bent by using a jig 11 and stress such as sigma=1.20X10<9>g/cm<3>is impressed upon the ferromagnetic thin film 14, the magnetic anisotropic constant is shown by K=-2.30X10<2>erg/cm<3>. Moreover, variation of magnetic anisotropy K is -9.0X10<2>erg/cm<3> and is shown by K=-2.5X10<2>erg/cm<3>. Magnetic anisotropy, therefore, is given in an optional direction by impressing stress upon the ferromagnetic thin film after forming such ferromagnetic thin film and its degree can be controlled by that of stress sigma.

Inventors

• 👤 Ryoichi Nakatani
• 👤 亮一 中谷
• 👤 Moichi Otomo
• 👤 茂一 大友
• 👤 Takayuki Kumasaka
• 👤 登行 熊坂
• 👤 Noritoshi Saitou
• 👤 斉藤　法利
• 👤 Takeo Yamashita
• 👤 武夫 山下

Bibliographic Details