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JPS6220876A Expired / Lapsed JP ⏱️ 0.0 years remaining

Preparation of silicon dioxide coated film

Assignee: Nippon Sheet Glass Co Ltd
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Filing: 1985-07-19
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Granted: —
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Expires: 2005-07-19
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Abstract

Abstract PURPOSE:To make the treatment of a spent waste liquid easy by using Al compd. or the like as an additive in case of bringing a base material into contact with an H2SiF6 soln. wherein SiO2 is made to a super-saturated state by additive and depositing an SiO2 coated film on the surface of the base material. CONSTITUTION:An H2SiF6 soln. saturated with SiO2 is prepared by dissolving a silicon oxide source (silica gel, silica glass or the like) in the H2SiF6 soln., and the H2SiF6 soln. wherein SiO2 is made to a super-saturated state is obtained by adding an additive to the soln. Further as the additive, one kind of compd. selected from among compounds of Al, Ca, Mg, Ba, Ni, Co, Zn, Cu and/or metal is used and the amount to be added is regulated to 0.01-1mol for 1mol H2SiF6 incorporated in the H2SiF6 soln. before the addition. When bringing a base material into contact with this soln., a uniform SiO2 coated film is deposited on the surface of the base material and also the treatment of the waste liquid is made easy.

Inventors

  • 👤 Hirotsugu Nagayama
  • 👤 永山 裕嗣
  • 👤 Hisao Honda
  • 👤 本多 久男
  • 👤 Hideo Kawahara
  • 👤 秀夫 河原

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-09 04:07
CPC Classifications
C; C23; C23C; C23C2/00; C23C2/04

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