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JPS62166362A Expired / Lapsed JP ⏱️ 0.0 years remaining

Liquid developer for electrostatic photography

Assignee: Fujifilm Holdings Corp
•
Filing: 1986-01-20
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Granted: —
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Expires: 2006-01-20
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Abstract

Abstract PURPOSE:To form a liquid developer having excellent stability of dispersion, redispersibility and fixability by obtaining a resin by a polymn. reaction in a soln. contg. a copolymer resin soluble in a nonaq. solvent obtd. by polymerizing specific monomers. CONSTITUTION:The monomers to form the resin consist of 99.95-90mol% monomer A which is soluble in an org. solvent and can form the polymer insoluble in the org. solvent by polymn. and 0.01-10mol% at least >=1 kinds of the monofunctional monomers B expressed by formula I. The resin is obtd. by the polymn. reaction in the soln. contg. the copolymer resin soluble in the nonaq. solvent obtd. by polymerizing the monomer C expressed by formula II and monomer D expressed by formula III. In formula II, L denotes an aliphat. group of >=8C, Y1 and Y2 may be the same or different, and respectively denote a hydrogen atoms or alkyl group. The monomer D is exemplified by the compd. expressed by formula I-1. The embodiment of the resultant resin is expressed by formula IV.

Inventors

  • 👤 Eiichi Kato
  • 👤 栄一 加藤
  • 👤 Masayuki Dan
  • 👤 團 誠之
  • 👤 Hiroshi Ishibashi
  • 👤 寛 石橋
  • 👤 Kazuo Ishii
  • 👤 一夫 石井
  • 👤 Hidefumi Sera
  • 👤 世羅 英史

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-07 09:19
CPC Classifications
G; G03; G03G; G03G9/00; G03G9/08; G03G9/12; G03G9/13; G03G9/131

Claims Analysis

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References Cited (Backward Citations)

JPS60185963A Cited

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