Method and apparatus for transferring among etching vessels automatically

Abstract

Abstract PURPOSE:To transfer wafer among respective vessels with a certain cycle without depending on heavy labor, by carrying out transferring operation of wafer in pure water vessel, strong acid vessel, and pure water washing vessel in order, automatically at a fixed operation period at etching of Si wafer. CONSTITUTION:When Si wafer is etched by strong acid, plural wafers are attached to cartridge in longitudinal direction, and moved on washing pure water vessel and strong acid etching vessels 21-24 arranged alternately. Dipping of cartridge into water vessel or acid vessel and pulling up therefrom are carried out vertically and at a fixed cycle, and cartridge clamp holder is protruded from seal plates 25, 26, and smooth movement is performed without shock, to prevent falling of impurities into vessel from upper parts of respective vessels due to sliding, friction, etc. Clean room partition plate 27 is provided to prevent entering of acidic gas from strong acid vessel into apparatus and etching treatment for obtaining superior quality is performed automatically.

Inventors

• 👤 Toshio Konishi
• 👤 敏夫 小西

Bibliographic Details