Exposure device

Abstract

Abstract PURPOSE:To enable the proper control of exposure energy, so as to form original plate images on the carrier with good reproducibility, by adjusting the luminous intensity of the light source per light emission interval, light emission time, or each time of light emission time. CONSTITUTION:The titled device has a control unit 71 controlling the exposure light source and each unit, thyratron 72 having switching function, an excimer laser 73 which is the pulse-lighted type light source, a mask 74, projection optical system 75, wafer 76, position signal detection circuit 77, capacitors C1 and C2, coil L, and resistor R. When the mask 74 and the wafer 76 are finished in positioning, the thyratron 72 is turned on by the control unit 71, and the excimer laser 73 is lighted by application of high voltage from a resonance circuit of the capacitors C1 and C2 with the coil L, resulting in exposure. In this case, the exposure energy is controlled by adjusting the luminous intensity of the light source per light emission interval, light emission time, or each time of light emission.

Inventors

• 👤 Isamu Shimoda
• 👤 下田　勇

Bibliographic Details