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JPS617666A Expired / Lapsed JP ⏱️ 0.0 years remaining

Nonvolatile semiconductor memory storage

Assignee: Fujitsu Ltd
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Filing: 1984-06-22
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Granted: —
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Expires: 2004-06-22
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Abstract

Abstract PURPOSE:To obtain a stable writing holding stage by forming an unp-doped semiconductor layer having electron affinity smaller than two semiconductor layers, to which secondary electron gas layers are shaped, between these two semiconductor layers. CONSTITUTION:An un-doped GaAs layer 2, an un-doped AlGaAs layer 3, an n type AlGaAs layer 4, an un-doped AlGaAs layer 5, an un-doped GaAs layer 6, an un-doped AlGaAs layer 7, an un-doped GaAs layer 8, an un-doped AlGaAs layer 9, an n type AlGaAs layer 10 and an n type GaAs layer 11 are formed onto a semi-insulating GaAs substrate 1 in succession. Source and drain electrodes 13, 14 brought into ohmic-contact with the layer 6 are shaped, and an opening section 19 is formed between the electrodes 13, 14 and a gate electrode 12 is shaped. According to the constitution, the layer 7 having electron affinity smaller than two-element electron gas layers 15, 16 formed on writing is shaped among the layers 15, 16, thus completely isolating the layers 15, 16 under a floating state after writing, then obtaining stable memorizing operation.

Inventors

  • 👤 Masahiko Sasa
  • 👤 佐々 誠彦

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-29 20:38
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/40; H10D30/47; H10D30/471; H10D30/473

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