Photosensitive composition for postive type photosensitive lighographic printing plafe

Abstract

Abstract PURPOSE:To improve the resistance to processing chemicals, the suitability to safelight and the affinity for ink by using novolak resin obtd. by (co)polycondensing at least one among phenol, m-cresol, o-cresol and p-cresol with aldehyde. CONSTITUTION:In a photosensitive composition for a positive type photosensitive lightographic printing plate contg. an o-quinonediazido compound and novolak resin, the novolak resin is composed of two or more kinds of novolak resins. Each of the novolak resins is obtd. by (co)polycondensing at least one among phenol, m-cresol, o-creson and p-cresol with a aldehyde. The amount of phenol is 5-75mol% of the total amount of phenol, m-cresol (and/or o-cresol) and p-cresol in all of the novolak resins in the photosensitive composition, the amount of m-sresol (and/or o-cresol) is 20-70mol%, and the amount of p-cresol is 5-75mol%.

Inventors

• 👤 Takeshi Yamamoto
• 👤 毅 山本
• 👤 Nobumasa Sasa
• 👤 信正 左々
• 👤 Mieji Nakano
• 👤 中野　巳恵治

Bibliographic Details