Amorphous silicon manufacturing device

Abstract

Abstract PURPOSE:To form an amorphous silicon film in succession for a long time and to improve mass productivity by providing a translucent glass plate moving with a substrate between the substrate and a light source radiating ultraviolet rays. CONSTITUTION:After plural unit 8 are accomodated in a film forming chamber 10 of an amorphous silicon manufacturing device, an amorphous silicon film is formed on a substrate 1 on the unit 8. After the substrate 1 is supplied from a load chamber 11 connecting with this film forming chamber 10, the substrate 1 forming a film is accomodated into an unload chamber 12. The unit 8 accomodated in this film forming chamber 10 is mounted on a conveyor 13 and carried to an arrow A direction. After a transparent window 14 of quartz glass is provided in a predetermined space in the bottom of the film forming chamber 10, a mercury lamp 15 is also arranged facing the transparent window 14. After the substrate 1 is carried with the conveyer 13 and the ultraviolet rays 7 is irradiated to the film forming chamber 10 from the mercury lamp 15, the amorphous silicon film are formed in succession and mass productivity is improved.

Inventors

• 👤 Ryoji Oritsuki
• 👤 折付　良二
• 👤 Kazuo Sunahara
• 👤 砂原　和雄
• 👤 Shoji Yamada
• 👤 山田　昭二
• 👤 Mikio Takahashi
• 👤 高橋　幹男
• 👤 Kenkichi Suzuki
• 👤 堅吉 鈴木

Bibliographic Details