Manufacture of thin-film magnetic head

Abstract

Abstract PURPOSE:To manufacture stably the thin-film magnetic head which has small gap depth size, high-precision gap depth, and excellent crush resistance by etching a gap material while using an organic insulating film as a mask and further etching the organic insulating film. CONSTITUTION:A lower magnetic body 3, gap material 4, conductor coil 5, and organic insulating film 6 are formed successively on a substrate 1 across a base film 2, and the organic insulating film 6 is used as a mask to etch the gap material 4, whih is tapered. Then, only the organic insulating film 6 is etched again selectively so as to move the front end point A of an organic insulating film behind a gap depth work stop point. Therefore, the front end point A is a gap-depth zero position and the extent of the backeard movement of the organic insulating film is the gap depth size. An upper magnetic body 7 and a protection film 8 are formed successively to complete a thin-film head element, gap depth work is performed in a direction C, i.e. from the side of a medium opposite surface, and polishing is carried out up to a point B where the gap material 4 has necessary gap length, thus completing the thin-film magnetic head.

Inventors

• 👤 Tetsuo Kobayashi
• 👤 哲夫 小林
• 👤 Sadakuni Nagaike
• 👤 長池　完訓

Bibliographic Details