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JPS6129153A Expired / Lapsed JP ⏱️ 0.0 years remaining

Flattening method of irregular surface substrate

Assignee: Fujitsu Ltd
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Filing: 1984-07-20
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Granted: —
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Expires: 2004-07-20
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Abstract

Abstract PURPOSE:To flatten at irregular surface substrate without strain with heat resistance and good reliability by forming a silicone resin of general formula I on the substrate, and thermally fusing the resin. CONSTITUTION:A silicon resin having approx. 40,000 or larger of means molecular weight represented by general formula I, where R is CH3, C(CH3), C2H5 or C6H5 is formed on an irregular surface substrate, and the resin is thermally fused. In order to prepare the flowing temperature of the resin to 300-400 deg.C with mean molecular weight of 25,000-50,000, the resin is thermoset at 350- 400 deg.C to alleviate pinholes and strain due to thermally decomposed product produced in case of thermosetting.

Inventors

  • 👤 Shunichi Fukuyama
  • 👤 俊一 福山
  • 👤 Yasuhiro Yoneda
  • 👤 泰博 米田
  • 👤 Masashi Miyagawa
  • 👤 昌士 宮川
  • 👤 Kota Nishii
  • 👤 耕太 西井

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-04 19:16
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/68; H10P14/683

Claims Analysis

Total Claims: 0
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References Cited (Backward Citations)

JPS5760330A Cited
JPS5957437A Cited

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