Susceptor for vapor growth apparatus

Abstract

Abstract PURPOSE:To prevent slips from occuring in a wafer and to improve device characteristics and a yield of products, by providing an opening for putting a wafer at the top of the susceptor body, and by making the receiving face in the opening a convex shape. CONSTITUTION:At the top of the susceptor body 11, an opening 13 for putting, for example a silicon wafer 12, is provided. The receiving face 14 of the opening 13 is made a convex shape. The convex shape of the receiving face 14 uniforms the temperature in the wafer, and prevents always slips from occuring. Moreover, since the ends of the silicon wafer 12 are free, stress produced in the wafer can be released, thereby also to prevent slips from occuring in the silicon wafer 12. As a result, deterioration of electric characteristic can be prevented and a yield of products can be improved.

Inventors

• 👤 Hideki Shirai
• 👤 秀樹 白井
• 👤 Yoshiaki Matsushita
• 👤 松下　嘉明
• 👤 Yuichi Mikata
• 👤 見方　裕一
• 👤 Shuichi Samata
• 👤 秀一 佐俣

Bibliographic Details