Vapor deposition device

Abstract

Abstract PURPOSE:To remove and recover automatically and easily a vapor deposition material by providing a device which removes and recovers the vapor deposition material sticking to a shutter by making use of the opening and closing operation of the shutter to a vapor deposition device. CONSTITUTION:The recovering device 26 consisting of a removing member 26b and a vessel 26a is attached to a vacuum vessel 1 by means of a supporting member 27 in the position approximately the middle of the opening and closing positions of the shutter 21 in the vessel 1. The shutter 21 passes the opening and closing positions while contacting with the member 26b when the shutter 21 is moved from the close position (solid line) to the open position (broken line). The vapor deposition material sticking to the shutter 21 is thereby removed and is dropped into the vessel 26a. The vapor deposition material is thus recovered. The vapor deposition material is removed as well when the shutter 21 moves from the open to the close position.

Inventors

• 👤 Kenichi Yasuda
• 👤 憲一 安田

Bibliographic Details