Diamond film and its production

Abstract

Abstract PURPOSE:To obtain the titled diamond film having a flat surface and without any clearance by depositing diamond from a vapor phase on a substrate provided with scratches of specified size. CONSTITUTION:A substrate 14 previously provided with 10<4> unit/mm<2> scratches having <=1mum size on the surface is placed on a substrate support 15 in a quartz reaction tube 4. After the inside of the reaction vessel 4 is evacuated to about 10<-5>Torr, gaseous hydrogen and a gaseous hydrocarbon are supplied from cylinders 10 and 11 to regulate the carbon concn. in the reaction system to 10<6>-10<10> unit/mm<2>. Then a heater 20 is electrically conducted to heat the substrate 14 and plasma is simultaneously generated between electrodes 12 and 13 to form on the substrate 14 a diamond film consisting of a polycrystal and having a flat surface having <=0.4mum surface roughness (the difference between the highest and the lowest site when the surface of the diamond film is observed by means of a scanning electron microscope).

Inventors

• 👤 Susumu Kawachi
• 👤 河内　進
• 👤 Katsuyuki Nakamura
• 👤 克之 中村

Bibliographic Details