Processing device using charged particle beam

Abstract

Abstract PURPOSE:To securely repair defects on a mask or a reticle in a short time by a method wherein an organic gas is decomposed by irradiating a sample in the organic gas atmosphere with the beam of charged particles through a small hole provided in a partition, and the decomposed substance of the organic gas is deposited to the sample at the position of the irradiation with charged particle beams. CONSTITUTION:The defect 53 produced by cutting the part of a pattern 52 on a glass substrate 51 to remain is irradiated with the charged particle beam B, resulting in the fine positioning of irradiation by means of a charged particle optical system 4; thereafter a sample chamber 13 is brought to the organic gas atmosphere through organic gas supply means 14, 15, and 16. At this time, the acceleration energy of the beam B is set between 1KeV and 200KeV whereby an organic gas molecule (g) constituting the organic gas G is effectively decomposed. The molecule (g) is chaned into the decomposed substance g' by colliding with the beam B, which substance then deposits in accumulation on the sample at the pattern defect position 53 and is partly carbonized.

Inventors

• 👤 Masahiro Yamamoto
• 👤 昌宏 山本
• 👤 Yoshitomo Nakagawa
• 👤 良知 中川
• 👤 Takashi Minafuji
• 👤 孝 皆藤

Bibliographic Details