Manufacture of quartz glass base material for optical transmission

Abstract

Abstract PURPOSE:To manufacture the titled base material causing no light absorption loss due to the presence of halogen by burning specified ester silane and a specified dopant in a quartz pipe to deposit a transparent glass film on the inner wall of the pipe and by making the pipe solid by melting. CONSTITUTION:Ester silane represented by formula I (where R<1> is H, methyl or ethyl, R<2> is methyl or ethyl, and n is 0-4) and a compound represented by formula II or III (where R<3> is univalent hydrocarbon) or a dopant represented by a formula PH3 in vessels 1-3 are fed to a mixer 6 together with a carrier gas introduced from a pipe 5, and they are mixed with gaseous O2 introduced from a pipe 7. The mixture is spouted into a quartz pipe 8 which is moved under rotation from a feed nozzle 9, and it is burned by heating with an oxyhydrogen flame burner 10 from the outside. Produced silica is deposited on the inner wall of the pipe 8 to form a transparent glass film. The pipe 8 is then melted by heating to about 2,000 deg.C, and it is made solid so that no air is left inside.

Inventors

• 👤 Haruo Okamoto
• 👤 岡本　治男
• 👤 Mikio Endo
• 👤 幹夫 遠藤

Bibliographic Details