Photosensitive silver halide material

Abstract

Abstract PURPOSE:To improve the antistatic property by incorporating a specified polyoxyethylene surfactant and nitron or an inorg. or org. acid salt of nitron into a photographic layer. CONSTITUTION:A polyoxyethylene surfactant represented by formula I or II(where each of R1-R4, R6 and R8 is H, alkyl, aryl or the like; each of R5 and R7 is alkyl, aryl or the like; and each of n1-n3 and m is 2-50) and nitron represented by formula III or IV, an inorg. acid salt of nitron such as nitron hydrochloride or an org. acid salt of nitron such as nitron salicylate or nitron benzoate are incorporated into a silver halide emulsion layer or other hydrophilic colloidal layer to obtain the desired photosensitive silver halide material. The accumulation of electrostatic charges on the material is prevented, so trouble due to accumulated electrostatic charges can be controlled.

Inventors

• 👤 Shigeki Yokoyama
• 👤 茂樹 横山
• 👤 Takeki Nakamura
• 👤 剛希 中村
• 👤 Junichi Koda
• 👤 甲田　純一
• 👤 Nobunaga Sekiguchi
• 👤 関口　伸永

Bibliographic Details