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JPS6076741A Expired / Lapsed JP ⏱️ 0.0 years remaining

Photosensitive silver halide material

Assignee: Fujifilm Holdings Corp
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Filing: 1983-10-03
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Granted: —
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Expires: 2003-10-03
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Abstract

Abstract PURPOSE:To improve the antistatic property by incorporating a nonionic surfactant and an anionic surfactant having a polyoxyethylene group into a silver halide emulsion layer or other hydrophilic colloidal layer. CONSTITUTION:One or more kinds of nonionic furfactants represented by formulae I , II, III (where R1 is 1-30C alkyl, alkenyl or the like; A is O, S or the like; each of R2-R5, R7 and R9 is H, alkyl or the like; each of R6 and R8 is alkyl, aryl or the like; and each of n1-n4 and m is 2-50) and one or more kinds of anionic surfactants each having a polyoxyethylene group represented by formula IV (where B is alkyl, alkenyl or the like; D is an anion; and n5 is 1- 50) are incorporated into a silver halide emulsion layer or other hydrophilic colloidal layer to obtain the desired photosensitive silver halide material. The accumulation of electrostatic charges on the material can be effectively prevented.

Inventors

  • 👤 Yasuo Kuraki
  • 👤 康雄 椋木
  • 👤 Shigeki Yokoyama
  • 👤 茂樹 横山
  • 👤 Hiroshi Kawasaki
  • 👤 博史 川崎
  • 👤 Riyouichi Nemori
  • 👤 良一 根守
  • 👤 Tetsuo Takeuchi
  • 👤 竹内 哲夫

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-05 22:18
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/005; G03C1/06; G03C1/38

Claims Analysis

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References Cited (Backward Citations)

JPS5329715A Cited

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