Photosensitive body

Abstract

Abstract PURPOSE:To obtain a sharp image good in gradation reproducibility by laminating on a conductive substrate a barrier layer contg. a-Si, O, and an impurity of group IIIA, or a-Si, C, O, a photoconductive layer contg. a-Si, and a light transmitting insulating surface-coating layer contg. a-Si:C:O:F. CONSTITUTION:A photosensitive body is formed by laminating on a conductive substrate 1, a 3-2,000nm thick barrier layer 2 made of a-Si, O, and an impurity of group IIIA, or a-Si, C, and O, a photoconductive layer 3 made of a-Si, and a 10-3,000nm thick light transmitting insulating surface-coating layer 4 made of a-Si:C:O:F in succession. When the layer 2 contains a-Si, O, an impurity of group IIIA, 5-60atm% O and about 200ppm impurity are contained, and when it contains a-Si, C, O, 5-60atm% C, and up to about 10atm% O are contained. The layer 4 contains 5-60atm% C and up to about 10atm% O, and up to about 10atm% F in a distribution uniform in the direction in parallel to the layer surface, and increasing in the film thickness direction. The photosensitive body thus obtained has good durability and it can form a sharp image of high density even under high temp. and high humidity.

Inventors

• 👤 Hiroshi Mizuno
• 👤 博 水野
• 👤 Shuji Iino
• 👤 修司 飯野
• 👤 Mochikiyo Oosawa
• 👤 大澤　以清
• 👤 Isao Doi
• 👤 勲 土井

Bibliographic Details