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JPS6042218A Expired / Lapsed JP ⏱️ 0.0 years remaining

Manufacture of extremely high purity silica

Assignee: Nippon Chemical Industrial Co Ltd
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Filing: 1983-08-15
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Granted: —
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Expires: 2003-08-15
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Abstract

Abstract PURPOSE:To manufacture high purity silica by ultrafiltering an aqueous soln. of an alkali silicate, treating it with an ion exchange resin to prepare purified silica sol. adding a specified coagulating agent to deposit and precipitate silica, separating the silica from the mother liquor, and heat treating it. CONSTITUTION:A commercially available aqueous soln. of sodium silicate or potassium silicate contg. 20-35% SiO2 is diluted to prepare an aqueous soln. contg. <10% SiO2. This aqueous soln. is ultrafiltered to remove collidal particles, and it is diluted to <=5% concn. of SiO2 and brought into contact with an ion exchange resin to prepare acidic silica sol. This silica sol is reacted with a coagulating agent which is gasified by heating such as NH4NO3, NH4Cl or (NH4)2CO3. Silica is deposited and precipitated by the reaction. The precipitated silica is separated from the mother liquor, and the coagulating agent sticking to the silica is gasified by heating to manufacture extremely high purity silica.

Inventors

  • 👤 Hiroyuki Kashiwase
  • 👤 弘之 柏瀬
  • 👤 Muneo Mita
  • 👤 三田 宗雄
  • 👤 Toshihiko Morishita
  • 👤 森下 敏彦
  • 👤 Hitoshi Koshimizu
  • 👤 仁 輿水
  • 👤 Kazuyoshi Torii
  • 👤 鳥居 一義

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-04 01:38
CPC Classifications
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