Fine abrasive powder

Abstract

Abstract PURPOSE:To provide fine powder which has a high abrasion rate and durability, gives a surface of good quality and is suitable for use in abrading semiconductor materials, optical glass etc., consisting of calcined alpha-alumina particles which have a particles size within the specified range and is in the form of thin plate. CONSTITUTION:A fine abrasive powder consists of alpha-alumina which has a particle size within the range of #3,000-#800 according to JIS, has a thickness of 5mu or below and a plate form having a ratio of diameter to thickness of 5-30 and has only been calcined without being melted. The powder has a high abrasion rate and durability and gives an abraded surface of good quality, as compared with conventional fine abrasive powder. The powder is particularly suitable for use in abrading semiconductor materials, optical glass, etc.

Inventors

• 👤 Kunihiro Miyazaki
• 👤 宮崎　国弘

Bibliographic Details