Manufacture of filter-attached optical waveguide

Abstract

Abstract PURPOSE:To obtain a filter-attached optical waveguide capable of being mass- produced without requiring assembling and adjustment steps by forming a optical waveguide on a substrate, covering it with a member for forming a filter film, and forming the filter film in this member. CONSTITUTION:An SiO2 clad layer 10 is formed in a desired circuit pattern by the photolithography on a light guide composed of an SiO2 buffer layer 8 and a core layer 9 of SiO2 doped with TiO2 formed on a quartz glass substrate 7. A filter film forming path 11 (filter film groove) is formed in this layer 10. The filter film 12 is a thin film conductive substrate alpha-Si, SiO2, and TiO2, and formed in this path 11 by the pyrolytic reaction of a raw material gas, such as SiH4 for alpha-Si, Si(OR)4 for SiO2, and Ti(OR)4 for TiO2, R being CnH2n+1, (n) being an integer.

Inventors

• 👤 Yasubumi Yamada
• 👤 泰文 山田
• 👤 Masao Kawachi
• 👤 河内　正夫
• 👤 Mitsuho Yasu
• 👤 安　光保
• 👤 Morio Kobayashi
• 👤 盛男 小林

Bibliographic Details