Formation of optical circuit element

Abstract

Abstract PURPOSE:To obtain fine waveguides having a large aperture angle and high accuracy by executing a new lift-off method using a mask plated to a metallic film pattern formed on an optical substrate. CONSTITUTION:A resist pattern 2 for the optical waveguides is formed on a glass substrate 1 and thereafter the thin metallic film 3 is uniformly formed on the substrate 1. The film 3 acts as a mask in a process for forming the waveguides. The metallic film pattern 4 where the optical waveguide parts are windowed is obtd. when the pattern 2 is removed by dipping the substrate into an org. solvent. The substrate is then dipped in a plating liquid and is subjected to a plating treatment with the metallic film pattern 4 as the cathode. The patterns 4 are preliminarily conducted to each other. A plating film 5 is grown on the pattern 4. The thickness of the film 5 is required to be determined by taking the thickness of the waveguides to be formed into consideration. A glass layer 6 is formed over the entire surface including the plating film 5 on the substrate 1 and the plating film is dissolved by an acid treatment.

Inventors

• 👤 Minoru Kiyono
• 👤 實 清野
• 👤 Hiroki Nakajima
• 👤 啓幾 中島

Bibliographic Details